1. High-quality ion beam etching and coating performance
This system employs ion beam etching and coating technology to produce dense, uniform, and fine-grained thin films with strong adhesion to the substrate. Compared with magnetron sputtering, ion beam–deposited coatings exhibit a smaller grain size at the same film thickness, resulting in smoother surfaces and reduced surface artifacts. These characteristics support high-resolution imaging and stable conductive coatings for electron microscopy and related analytical applications.
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