IMP120 Multi-Beam Ion Beam Processing System for Surface Modification and Thin Film Engineering

Key Advantages
• Multi-beam configuration: Enables simultaneous or sequential ion beam etching and ion beam deposition, improving process efficiency and flexibility.
• High surface processing precision: Supports nanoscale control over surface roughness, film density, and interface quality.
• Process adaptability: Suitable for a wide range of materials, including metals, semiconductors, ceramics, and optical coatings.

Product Features
• Independent ion beam control: Each ion source can be adjusted independently, allowing fine tuning of beam energy, current, and incident angle.
• Vacuum-based thin film processing: Operates under high-vacuum conditions to ensure clean deposition and contamination-free surface modification.
• In situ process monitoring support: Compatible with monitoring and feedback modules for improved process stability and reproducibility.

Typical Applications
• Ion beam surface modification for functional and structural materials
• Thin film engineering for optical, electronic, and protective coatings
• Precision ion beam polishing and etching for micro- and nano-scale structures

Q: How long will it take to receive a reply after placing the inquiry?

We attach great importance to every inquiry. On working days, we will respond within 12 hours after receiving the inquiry. 

Q: What products do you mainly offer?

We focus on the research and development as well as the supply of laboratory equipment and safety compliance testing instruments.

Q: In which fields is this product mainly applied?

Our products are widely applied in various fields, mainly including the electronics industry, the medical industry, the automotive industry, semiconductors, the research field, the optoelectronic industry, and the new energy sector.